Optorun — Optical Thin-Film Vacuum Deposition Systems & Coating Platforms
Global sourcing of optical thin-film vacuum deposition systems from Optorun Co., Ltd. (Japan). High-performance lines OTFC, HOTF, NSC, ALDER, COFC, and OWLS, vacuum components, and turnkey process solutions for precision optics, automotive sensors, and semiconductors from SpareX.
Ion Source Beam Assisted Deposition Systems OTFC
Ion-assisted deposition systems of the OTFC series incorporate vacuum chambers from φ900 to φ1800 mm in diameter. The platform features dual electron beam guns and a 60-point optical thickness monitor. It reliably deposits over 100 dense layers for high-precision filters.
- Vacuum chamber with diameter from φ900 to φ1800 mm for batch substrate loads
- Dual independent electron beam guns with multi-hearth crucible configurations
- Radio frequency ion source achieving uniform high-density ion bombardment flux
- Replacement crucible hearths, electron emitters, HOM sensors, and Viton seals
High-Productivity Vacuum Evaporation Systems HOTF
High-productivity evaporation systems in the HOTF series deliver cost-effective mass production of optical coatings. The pumping system utilizes a turbomolecular pump to minimize particulate emissions. The integrated OIS-26H ion source is tailored for high-rate film growth.
- High-vacuum pumping train featuring a turbomolecular pump for low particulates
- Integrated OIS-26H ion source engineered for accelerated thin-film deposition
- Low particulate release engineered for optical filters and miniature device lenses
- Heater elements, carousel guide bearings, foreline traps, and cathode shields
Optical Thin Film Sputtering Systems NSC
Magnetron sputtering systems of the NSC series operate in load-lock metal mode for optical films. A highly reactive plasma source produces layers with ultra-low optical absorption. The rotating drum substrate mechanism ensures uniform deposition across wide aperture optical parts.
- Load-lock transfer chamber maintaining steady high vacuum in the main process area
- Ultra-low optical absorption achieved by an inductively coupled plasma source
- Rotary substrate drum mechanism minimizing mechanical wear and dust creation
- Sputtering target materials, plasma electrodes, and mass flow controllers (MFC)
Plasma Enhanced Atomic Layer Deposition Systems ALDER
Plasma-enhanced atomic layer deposition systems of the ALDER series coat complex 3D shapes. The tool grows uniform conformal optical films on steep lens profiles at low substrate temperature. This process prevents thermal deformation in temperature-sensitive polymer optics.
- Conformal uniform film growth over complex three-dimensional optical profiles
- Low-temperature plasma activation compatible with sensitive polymer elements
- Rotary substrate fixture ensuring uniform precursor vapor coverage across batches
- Ultra-fast ALD pulse valves, precursor canisters, and purge line pressure sensors
Continuous Optical Evaporation Systems COFC
Continuous optical evaporation systems of the COFC series integrate two auxiliary heating modules. High substrate dome transport speed supports continuous production runs for anti-reflective coatings. A multi-point reflective optical monitor controls layer thickness in real time.
- Dual auxiliary heating chambers providing inline degassing without vacuum loss
- High-velocity dome transport drive engineered for uninterrupted batch flow
- Multi-point reflective optical monitor delivering automated thickness feedback
- Vacuum slit valves, quartz infrared lamps, dome drive rollers, and thermocouples
Ion Sources OIS & High-Precision Optical Monitors HOM
OIS series ion sources and HOM optical monitors form the core precision units of Optorun platforms. Filament-free OIS ion sources deliver prolonged service life with minimal chamber contamination. HOM and DHOM monitors track optical film thickness on rotating dome fixtures.
- Filament-free ion source configuration delivering extended maintenance cycles
- Direct in-situ optical thickness tracking across the rotating dome fixture surface
- Adjustable measurement sensor geometry adapting to diverse dome curvatures
- Optical collimator heads, spectrometer probes, RF coils, and vacuum coaxial leads
Advanced Optical Thin-Film Deposition Equipment Portfolio
Optorun Co., Ltd. manufactures advanced optical thin-film deposition equipment including OTFC ion beam assisted evaporators, HOTF mass-production systems, and NSC sputtering platforms. The platforms ensure layer thickness precision across multi-layer dielectric stacks with variance below 0.1%.
The machinery ecosystem spans flagship OTFC coaters with vacuum chambers up to φ1800 mm, inline COFC continuous systems, high-throughput HOTF models for consumer optics, and load-lock NSC magnetron tools for wafer-level optical integration.
Equipment Sizing and Vacuum Deposition Configuration Criteria
Selecting an Optorun vacuum system depends on substrate diameter, required film layers, deposition method, and optical thickness monitoring tolerance. For coating micro-optics and polymer lens elements without thermal strain, the ALDER plasma-enhanced ALD platform provides full conformal coverage.
For high-volume production of edge filters, bandpass elements, and camera components, OTFC and HOTF platforms deliver automated multi-hearth deposition. SpareX provides engineering assessments, vacuum chamber configuration sizing, and direct global equipment delivery.
Optorun and model names are trademarks of their respective owners and are used only to identify the equipment for which we source parts. SpareX is not an official dealer, distributor or representative of Optorun and is not affiliated with the trademark owner. Origin, documents and warranty are stated for each item in the quotation.
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Documents and sources
- Official Optorun website — company profile, vacuum technologies, and global facilities
- Ion source beam assisted deposition systems OTFC — technical specifications and chamber diameter
- High-productivity vacuum evaporation systems HOTF — turbomolecular pumping and OIS-26H sources
- Optical thin film sputtering systems NSC — metal mode and reactive plasma sources
- Atomic layer deposition systems ALDER — low-temperature coating on three-dimensional optics
- Continuous evaporation systems COFC — auxiliary heating chambers and layer monitoring
- Ion sources OIS and optical monitors HOM — tooling durability and spectral thickness control
- Ion sources OIS — technical specifications of RF plasma ion beam sources
