Allwin21 Semiconductor Process Equipment

Allwin21 is a semiconductor equipment manufacturer based in Morgan Hill, California, founded in 2000: AccuThermo rapid thermal processors, plasma ashers and etchers, AccuSputter sputter systems and AWgage metrology.

AccuThermo AW610M desktop RTP

AW610M is a semi-automatic atmospheric rapid thermal processor for wafers up to 6 inches, built on the AG Associates Heatpulse 610 platform. 21 Ushio lamps above and below heat in 6 zones, with a thermocouple up to 840 °C, a pyrometer up to 1250 °C and ramp-up of 10-120 °C/s.

Wafers up to 6 inches
21 lamps, 6 heating zones
Ramp-up 10-120 °C/s
Pyrometer up to 1250 °C

AccuThermo AW820M and AW820V RTP

AW820M is a standalone semi-automatic RTP for wafers up to 8 inches: 27 lamps in 10 zones, a typical steady-state range of 150-1150 °C, up to 1250 °C, and recipe steps up to 9999 s. AW820V is the vacuum version with a dry pump or a dry pump with a turbo pump.

Wafers up to 8 inches
27 lamps, 10 heating zones
Up to 1250 °C
Vacuum version AW820V

AW820R, AW820RV and AW1230R automatic RTP

AW820R is an automatic atmospheric RTP for 3-8 inch wafers with robotic wafer handling, an isolated quartz tube and pyrometer control. Ramp-up is programmable up to 250 °C/s, and the typical steady-state range is 400-1150 °C. AW820RV is the vacuum version; AW1230R handles 12-inch wafers.

Wafers 3-8 inches
Ramp-up up to 250 °C/s
Robotic wafer handling
AW1230R: 12-inch wafers

AW-105R and AW-10R downstream plasma ashers

Single-wafer downstream plasma ashers for low-damage descum and surface cleaning. AW-105R takes 2-6 inch wafers with a 300 W or 600 W RF generator, AW-10R takes 4-8 inch wafers with 600 W or 1000 W, both at 13.56 MHz. Wafers are moved by an integrated 3-axis robot.

Wafers 2-8 inches
RF generator 13.56 MHz
Power 300-1000 W
Integrated 3-axis robot

AW-B3000 barrel plasma asher

AW-B3000 is a desktop semi-automatic batch plasma asher, cleaning and etching system. Its quartz reactor, 12 inches in diameter and 23 inches deep, takes small samples up to 8-inch wafers, with a 600 W, 1000 W or 1200 W RF generator at 13.56 MHz, 1-4 gas lines and manual loading.

Reactor 12 × 23 inches
Samples up to 8 inches
RF power up to 1200 W
Batch processing

AW-303R and AW-901eR/903eR plasma etchers

AW-303R is an automatic downstream isotropic plasma etcher for 2-6 inch wafers, with RF power up to 650 W and NF3, O2 and He process gases. AW-901eR and AW-903eR form a production-proven plasma etch and RIE platform for isotropic or anisotropic dry etching.

Wafers 2-6 inches
RF power up to 650 W
Isotropic downstream etch
Reactive ion etching

AccuSputter AW4450 and AW4480 sputter systems

AW4450 (semi-auto) and AW4480 (auto) are RF, DC and pulsed DC magnetron sputter systems based on the 4400/4410/4450 platform. They have a load lock, a rotating substrate table, up to 3 Delta or 4 round 8-inch cathodes, and support reactive sputtering and co-sputtering.

Substrates up to 8 inches
Up to 4 cathodes
Load lock operation
RF, DC and pulsed DC

AWgage-150 and AWgage-200 sheet resistance systems

Compact benchtop non-contact systems measure the sheet resistance of conductive thin films by eddy current and calculate film thickness when resistivity is known. AWgage-150 takes 2-6 inch wafers, AWgage-200 takes 4-8 inch wafers, with 1, 5 or 9 test points and touchscreen control.

Eddy current method
Wafers 2-8 inches
1, 5 or 9 test points
Power 110/220 VAC

Selecting Allwin21 equipment by process and wafer size

Equipment is chosen by process and wafer size. For rapid thermal processing (dopant activation, oxidation and nitridation, contact anneal) there is the AccuThermo series: AW610M for wafers up to 6 inches, AW820M up to 8 inches, the automatic AW820R and AW820RV, and AW1230R for 12 inches.

The manufacturer recommends atmospheric RTP for most applications and vacuum RTP only when the process truly requires reduced pressure.

For resist removal there are the single-wafer AW-105R and AW-10R or the batch AW-B3000; for etching, AW-303R (isotropic) and AW-901eR/903eR (RIE); for metallization, AccuSputter AW4450 and AW4480; for conductive film control, AWgage-150 and AWgage-200.

Semiconductor materials and tool upgrades

AccuThermo systems process Si, SiC, GaN, GaAs and InP; the isolated quartz chamber helps maintain wafer purity, and an oxygen sensor protects oxygen-sensitive processes.

Allwin21 was founded in 2000 in Silicon Valley and is headquartered in Morgan Hill, California; it has been a SEMI member since 2007.

The company upgrades legacy Heatpulse, MPT, Matrix, Gasonics, Tegal, Branson/IPC, Lam, Perkin-Elmer and MRC tools with a new controller, Allwin21 software, interface boards and wafer handling.

Allwin21 and model names are trademarks of their respective owners and are used only to identify the equipment for which we source parts. SpareX is not an official dealer, distributor or representative of Allwin21 and is not affiliated with the trademark owner. Origin, documents and warranty are stated for each item in the quotation.