EKSPLA Scientific and Industrial Lasers

EKSPLA is a Lithuanian maker of solid-state and fiber lasers and laser electronics for science and industry, established in 1992 in Vilnius, with 170 people and subsidiaries in the US, UK and China.

NL300, NL230 and NL200 nanosecond lasers

Q-switched Nd:YAG lasers. The flashlamp-pumped NL300 delivers up to 1100 mJ, 3–6 ns pulses at 5–20 Hz, with harmonic modules up to the 5th. The diode-pumped NL230 gives up to 190 mJ at up to 100 Hz. The compact air-cooled NL200 gives up to 4 mJ at up to 2500 Hz.

Pulse energy up to 1100 mJ
Pulse duration 3–6 ns
NL230 rate up to 100 Hz
NL200 rate up to 2500 Hz

PL2250, PL2230 and PL2210 picosecond lasers

Mode-locked Nd:YAG lasers. The PL2250 with a flashlamp-pumped power amplifier delivers up to 100 mJ at up to 20 Hz, 30 ps pulses (20 ps optional). The diode-pumped PL2230 gives up to 40 mJ at 100 Hz. The air-cooled PL2210 runs at kilohertz repetition rates.

Pulse energy up to 100 mJ
Pulse duration 30 ps
PL2230 rate 100 Hz
Streak trigger jitter <10 ps

FemtoLux industrial femtosecond lasers

FemtoLux for micromachining delivers up to 50 W at 1030 nm; FemtoLux HE reaches 1 mJ, up to 2 mJ in burst mode. Repetition rate runs from single shot to 4 MHz. Dry cooling uses no water, with the PSU and cooling unit in one 4U rack housing. FemtoLux 3 is a 3 W fiber laser.

Output power up to 50 W
FemtoLux HE up to 1 mJ
Repetition rate up to 4 MHz
Dry cooling, no water

NT tunable wavelength nanosecond lasers

A pump laser and an OPO share one housing. NT340 tunes without gaps from 192 to 4400 nm with up to 150 mJ in the visible range at up to 20 Hz. NT230 covers 192–2600 nm, NT240 covers 210–2600 nm at 1000 Hz, and NT270 covers 2500–4475 nm for IR spectroscopy.

Tuning range 192–4400 nm
Pulse energy up to 150 mJ
NT240 rate 1000 Hz
NT270 up to 4475 nm

PT, PGx01 and FemtoTune tunable systems

PT277 combines a picosecond optical parametric oscillator and a pump laser in one housing, with gap-free tuning from 4800 to 18500 nm. PT401 and PT403 cover 210–2300 nm, and PGx01 covers 193–2300 nm with peak power above 50 MW. FemtoTune delivers pulses shorter than 50 fs.

PT277 up to 18500 nm
PT403 range 210–2300 nm
Peak power over 50 MW
FemtoTune below 50 fs

UltraFlux, PicoFlux and NanoFlux high intensity systems

Custom systems with pulse energy up to 10 J. UltraFlux HE gives up to 1 J at 5 Hz and pulses down to 10 fs, PicoFlux HE up to 2.2 J at 10 Hz, NanoFlux SLM up to 10 J, diode-pumped NanoFlux HP up to 5 J. In 2023 SYLOS 3 was installed at ELI-ALPS, Hungary, with Light Conversion.

Pulse energy up to 10 J
Pulses down to 10 fs
PicoFlux HE 2.2 J
UltraFlux HE 1 J

PhotoSonus photoacoustic lasers and SFG spectrometers

PhotoSonus M is a mobile source for photoacoustic imaging: up to 250 mJ, tuning over 330–2300 nm at 10 or 20 Hz, with the pump laser, OPO and PSU in one unit. The diode-pumped PhotoSonus X gives up to 90 mJ at 100 Hz. SFG spectrometers study surfaces and interfaces.

Output energy up to 250 mJ
Tuning range 330–2300 nm
PhotoSonus X at 100 Hz
SFG surface spectrometers

Laser electronics: drivers, power supplies, ovens

uniLDD laser diode drivers and uniPS power supplies provide 10 to 1200 A and up to 6 kW. PCD Pockels cell drivers deliver up to 9.8 kV at up to 6 MHz. The SY4000 delay generator has 8 channels with 25 ps resolution, and the TK8 nonlinear crystal oven heats up to 80 °C.

Diode current 10–1200 A
Pockels cell up to 9.8 kV
Delay generator 8 channels
Crystal oven up to 80 °C

Selecting an EKSPLA laser by task

For ablation, LIBS and OPO pumping the choice is a nanosecond Nd:YAG laser: NL300 with up to 1100 mJ at 5–20 Hz, NL230 with up to 190 mJ at up to 100 Hz, NL200 with up to 4 mJ at up to 2500 Hz.

Time-resolved spectroscopy uses picosecond PL2250 (up to 100 mJ, 30 ps), PL2230 (up to 40 mJ at 100 Hz) and the kilohertz PL2210.

Tunable wavelength comes from NT340 (192–4400 nm, up to 150 mJ), NT230, NT240 and NT270, and from picosecond PT277 (up to 18500 nm), PT401, PT403 and PGx01.

Industrial FemtoLux lasers up to 50 W and the FemtoLux 3 fiber laser serve micromachining, PhotoSonus M and X serve photoacoustic imaging, and UltraFlux, PicoFlux and NanoFlux reach up to 10 J for high energy physics.

EKSPLA manufacturing and projects

EKSPLA was established in 1992 in Vilnius, Lithuania, and traces its roots to the laser division of EKSMA founded in 1983. The team counts 170 people, subsidiaries operate in the US, UK and China, and more than 25 representative offices work around the globe.

In 2019 the SYLOS laser system, built together with Light Conversion, was launched at the ELI-ALPS research center in Hungary; SYLOS 3 was installed there in 2023. The UltraFlux HE series was originally built for ELI-ALPS. EKSPLA laser electronics run inside more than 30,000 laser systems.

EKSPLA and model names are trademarks of their respective owners and are used only to identify the equipment for which we source parts. SpareX is not an official dealer, distributor or representative of EKSPLA and is not affiliated with the trademark owner. Origin, documents and warranty are stated for each item in the quotation.