Kanken Techno Exhaust Gas Abatement Systems and Scrubbers

Engineered Kanken Techno KT1000, KPL, and KW exhaust gas abatement systems: electric thermal oxidizers, atmospheric plasma scrubbers, and wet scrubbers for semiconductor fabrication lines.

KT1000MFH-SQ Thermal Oxidation Scrubbers

KT1000MFH-SQ systems utilize electric thermal oxidation with proprietary Kanken thermal insulation. The unit reduces water consumption by 30-50% and footprint by 20% compared to earlier models. It delivers reliable abatement for 300mm wafer fabrication lines under heavy process gas loading.

Proprietary insulation
Water reduced by 30-50%
Footprint reduced by 20%
300mm wafer fab lines

KT1000MFH and KT1000MFS High-Dust Abatement Units

KT1000MFH and KT1000MFS units handle high dust load process exhausts on 200mm and 300mm semiconductor lines. Equipped with standard energy-saving modes, they feature front and rear two-way service access. The architecture ensures continuous uptime and minimal running costs during heavy shifts.

Energy-saving mode
For 200mm & 300mm lines
Two-way maintenance access
High dust load handling

KT1000EPS Epitaxial Scrubbers for SiC Processes

KT1000EPS abatement units safely handle high-concentration hydrogen in silicon carbide epitaxial processes. An integrated inlet scrubber eliminates water-soluble compounds and prevents clogging from TCS and DCS decomposition. Fail-safe interlocks guarantee plant and operator safety around the clock.

SiC epitaxial processes
High H2 concentration
Anti-clogging inlet stage
Fail-safe safety interlocks

KT1000MOC Large-Flow Units for MO-CVD Equipment

KT1000MOC systems decompose high flow rates of NH3 and H2 from MO-CVD reactors through electric thermal oxidation. Utilizing reaction heat during operation, heaters turn off to save power under stable gas stream. Inlet temperature monitoring provides instant anti-backfire dilution response.

NH3 and H2 abatement
Zero fossil fuel usage
Exothermic heat reuse
Anti-backfire safety loop

KPL-WTR and KPL-C13 Atmospheric Plasma Scrubbers

KPL series scrubbers employ stable atmospheric arc plasma to destroy persistent PFC greenhouse gases. KPL-WTR achieves over 99% abatement efficiency on CF4, NF3, and SF6 streams. An integrated water scrubber removes acidic fluoride by-products to prevent downstream corrosion in exhaust lines.

Atmospheric arc plasma
CF4 abatement over 99%
Destroys SF6, NF3, PFCs
Integrated water scrubber

KT1000HBD Hybrid Abatement Units for Etch Tooling

KT1000HBD hybrid systems combine electric ignition with fuel combustion heat to treat high-load dry etch effluents. Processing large flow rates up to 600 slm without misfire risk, the thermal storage design ensures deep destruction of persistent fluorides while minimizing total emissions.

Flow rate up to 600 slm
Electric ignition system
For dry etching exhausts
Thermal storage chamber

KW Series Two-Tower Compact Wet Scrubbers

KW series two-tower wet scrubbers treat water-soluble and hydrolysable semiconductor process exhausts. The combination of spray nozzles and structured packing delivers high absorption efficiency. Explosion-proof construction safeguards facilities when flammable compounds enter the gas line.

Two-tower architecture
Targeted spray nozzles
Structured packing bed
Explosion-proof design

KD Series Dry Adsorption Exhaust Gas Scrubbers

KD series dry adsorption scrubbers provide safe sealed treatment for toxic hydrides including AsH3 and water-free SiH4. Operating without fuel, the unit generates zero secondary CO2 emissions. A dual-column design with automatic switching guarantees continuous uptime during column changeover.

Sealed dry adsorption
AsH3 and SiH4 treatment
Zero CO2 emissions
Dual-column switching

Design Features and Energy Efficiency of the KT1000 Series

Kanken Techno KT1000 series exhaust gas abatement systems provide high-efficiency electric thermal oxidation for hazardous semiconductor process gases.

The advanced KT1000MFH-SQ model incorporates proprietary thermal insulation, reducing water consumption by 30-50% and footprint by 20% for seamless integration into modern 200mm and 300mm wafer fabrication sub-fabs.

For heavy-duty dry etching and deposition processes, Kanken Techno delivers the KT1000MFH model featuring extended particulate holding capacity and two-way maintenance access. Electric thermal decomposition eliminates fossil fuel consumption and minimizes factory CO2 emissions.

Deployment of KPL Plasma Scrubbers and KT1000HBD Hybrid Units

KPL series scrubbers utilize steady atmospheric arc plasma to destroy persistent greenhouse PFC gases including CF4, NF3, and SF6. In the KPL-WTR model, a redesigned high-temperature torch achieves over 99% destruction removal efficiency while an integrated wet stage scrubs acidic by-products.

KT1000HBD hybrid systems combine electric ignition with combustion heat to process large gas streams up to 600 slm, eliminating flame-out risks during rapid fluctuations in chamber exhaust flow.

Global Installed Base and Manufacturing Infrastructure

Presented at the SEMI conference in November 2024, Kanken Techno accumulated over 20000 installations across leading semiconductor fabs in the USA, China, Taiwan, Korea, Singapore, and Japan. Manufacturing plants in Nagaokakyo (Kyoto), Niigata, and Pinghu deliver precision environmental hardware.

Robust engineering, redundant fail-safe interlocks, and dedicated regional technical hubs ensure full compliance with international cleanroom environmental standards.

Kanken Techno and model names are trademarks of their respective owners and are used only to identify the equipment for which we source parts. SpareX is not an official dealer, distributor or representative of Kanken Techno and is not affiliated with the trademark owner. Origin, documents and warranty are stated for each item in the quotation.